EUV lithography systems – Products - ASML
Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
5 things you should know about High NA EUV lithography - ASML
2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.
TWINSCAN NXE:3600D - EUV lithography systems - ASML
The EUV lithography solutions provided by the TWINSCAN NXE:3600D are complementary to those provided by our TWINSCAN NXT systems based on ArF immersion technology. The NXE platform uses 13.5 nm EUV light, generated by a tin-based plasma source, to expose 300 mm wafers with a max exposure field size of 26 mm x 33 mm.
TWINSCAN NXE:3400C – EUV lithography systems - ASML
Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability complementary to ASML’s ArFi technology.
Light & lasers - Lithography principles| ASML
EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.
TWINSCAN EXE:5000 - EUV lithography systems - ASML
The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher …
Making EUV: from lab to fab – Stories - ASML
2022年3月30日 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV system, as well as a glimpse of what’s next.
TWINSCAN NXE:3800E – EUV lithography systems - ASML
ASML’s TWINSCAN NXE:3800E is a dual-stage extreme ultraviolet (EUV) system that supports high-volume manufacturing of 2 nm Logic nodes and leading-edge DRAM nodes.
ASML and imec open joint High NA EUV Lithography Lab offering …
2024年6月3日 · The opening of the joint ASML-imec High NA EUV Lab represents a milestone in preparing High NA EUV for high-volume manufacturing – anticipated to happen in the 2025–2026 timeframe.
Busting ASML myths
2022年2月23日 · ASML is building a new kind of EUV lithography machine. TRUE. In the semiconductor industry, innovation never stops. That's why we're building a next-generation EUV platform that increases the numerical aperture (NA) from 0.33 to 0.55.