Continuous-wave (CW) coherent light sources in the deep UV (DUV) region have been rea-lized using solid-state lasers, gas lasers, and fiber la-sers [1–4]. Whereas nonlinear frequency conversion...
深紫外ファイバーレーザ Cygnus | 製品一覧
半導体フォトマスク検査に最適な199nmのDUVレーザ. ファイバーレーザによる基本波の発生と固体非線形結晶による高調波発生と合成 特 長. 発振波長199nm、出力80mW以上; 高効率かつ安定した固体非線形結晶による短波長への波長変換; パルス光源によるマスク ...
A high-resolution mask inspection system using 199nm wavelength has been developed to enable the defect inspection of EUV mask. To expand the potential of inspection optics resolution, super ...
Overview of the DUV laser based on fiber/ bulk MOPA systems.
Overview of the DUV laser based on fiber/ bulk MOPA systems. [...] A high-pulse-repetition-frequency (PRF) pulsed light source in the deep ultraviolet region has been realized by a multiple...
193 nm sub-mW - TOPTICA Photonics AG
Our general technology portfolio to achieve UV wavelengths is based on two times resonantly frequency-doubling of an amplified external cavity diode laser (TA-FHG pro). In order to realize DUV wavelengths, we incorporate a unique non-linear optical crystal.
A novel defect detection optical system using 199-nm light source …
2010年3月11日 · A novel EUV mask inspection tool with 199nm laser source and super-resolution technique has been developed. This tool is based on NPI-5000PLUS, which is a photo-mask inspection tool for hp2X nm node …
Generation of 10W, 1ns Deep Ultraviolet Pulse at 193nm
Deep ultraviolet (DUV) lasers are actively used for semiconductor lithography. Argon fluoride excimer laser (ArF excimer laser) is the typical light source which can generate above 100-W optical power at the wavelength of below 200-nm with several tens …
Study of EUV mask inspection technique using DUV light source …
2010年9月29日 · We have already developed the mask inspection system using 199nm wavelength with simultaneous transmitted and reflected illumination optics, which utilize p-polarized and s-polarized illumination for high defect detection sensitivity, and we developed a new image contrast enhancement method which changes the digitizing rate of imaging sensor ...
Study of advanced mask inspection optics with super-resolution …
2009年3月13日 · A novel high-resolution mask inspection platform using DUV wavelength has been developed, which works at 199nm. The wavelength is close to the wavelength of ArF exposure tool. In order to adapt 199nm optics for hp2x nm node and beyond defect detection on next generation mask with appropriate condition, further development such as the ...
199 nm VUV coherent light emission from ultracompact SrB4O7 …
Using this crystal, we successfully achieved 199 nm vacuum-ultraviolet second harmonic generation with a picosecond laser. The achieved wavelength of 199 nm is shorter than the theoretical minimum of 205 nm for second harmonic generation in BaB 2 O 4.