Lam Research Corporation (Nasdaq: LRCX) today announced that its innovative dry photoresist (dry resist) technology has been ...

Digital photo and scanning electron microscope of a transparent hybrid photoresist film of titanium dioxide nanoparticle-embedded acrylic resin with thickness of 29 μm Credit must be given to the ...

An image of a mask containing the structure of an integrated circuit (IC) is projected onto a silicon wafer, which is coated with a light-sensitive material known as a photoresist. When the ...

In 2024, China made notable strides in photoresist development, supported by government initiatives and rising demand from local chipmakers, reports TrendForce. Semiconductor photoresists are ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines. This ...

Conducted under the supervision of Prof. Kwok Hoi-Sing, Founding Director of the State Key Laboratory of Advanced Displays ...

Scientists from The Hong Kong University of Science and Technology has created the first-of-its-kind deep-ultraviolet (UVC) ...

Integrated circuits are patterned by exposing light-sensitive photoresist materials deposited on silicon wafers and then removing the exposed (or sometimes unexposed) areas using low-pressure ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of ...

A team of engineers at the Hong Kong University of Science and Technology (HKUST) has made a groundbreaking invention in ...