Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist Technology
Lam Research Corporation (Nasdaq: LRCX) today announced that its innovative dry photoresist (dry resist) technology has been ...
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Russia plans EUV chipmaking tools that it says will be cheaper and easier to build than ASML's — country outlines new roadmap to smaller chips
EUV tools with a 11.2nm wavelength The Russian ... designed and optimized for the new wavelength. The laser source, resist chemistry, contamination control, and other supporting technologies ...
Nature1mon
Lithography at EUV wavelengths
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
Investing6d
Lam Research advances chipmaking with dry resist technology
At imec, the 28nm pitch dry resist processes developed by Lam are compatible with both low and high numerical aperture (NA) EUV scanners. These processes not only enhance EUV sensitivity and ...
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Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool — High-NA tools' EUV light source and mirrors are functional
ASML's Twinscan EXE High-NA EUV litho machines with projection optics ... "The light source was already working, now we have the photons 'in resist' on the wafer." ASML specialists are still ...
Consumer Reports1mon
Chevrolet Bolt EUV
The new-for-2022 Bolt EUV (electric utility vehicle) is a taller, roomier version of the Bolt. Both the Bolt EV and the EUV share the same 200-hp electric motor that drives the front wheels ...
Morningstar6d
Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist Technology
An advanced patterning technique introduced by Lam, dry resist enhances the resolution, productivity and yield of extreme ultraviolet (EUV) lithography, a pivotal technology used in the production ...